JPH0318170U - - Google Patents
Info
- Publication number
- JPH0318170U JPH0318170U JP7665189U JP7665189U JPH0318170U JP H0318170 U JPH0318170 U JP H0318170U JP 7665189 U JP7665189 U JP 7665189U JP 7665189 U JP7665189 U JP 7665189U JP H0318170 U JPH0318170 U JP H0318170U
- Authority
- JP
- Japan
- Prior art keywords
- elliptical mirror
- radio wave
- shielding plate
- focal point
- wave shielding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010438 heat treatment Methods 0.000 claims description 3
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Optical Elements Other Than Lenses (AREA)
- Circuit Arrangements For Discharge Lamps (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Furnace Details (AREA)
- Discharge Lamps And Accessories Thereof (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Control Of Resistance Heating (AREA)
- Constitution Of High-Frequency Heating (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7665189U JPH0647014Y2 (ja) | 1989-06-29 | 1989-06-29 | イメージ加熱装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7665189U JPH0647014Y2 (ja) | 1989-06-29 | 1989-06-29 | イメージ加熱装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0318170U true JPH0318170U (en]) | 1991-02-22 |
| JPH0647014Y2 JPH0647014Y2 (ja) | 1994-11-30 |
Family
ID=31618311
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7665189U Expired - Lifetime JPH0647014Y2 (ja) | 1989-06-29 | 1989-06-29 | イメージ加熱装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0647014Y2 (en]) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010198906A (ja) * | 2009-02-25 | 2010-09-09 | Seiko Epson Corp | 光源装置およびプロジェクタ |
-
1989
- 1989-06-29 JP JP7665189U patent/JPH0647014Y2/ja not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010198906A (ja) * | 2009-02-25 | 2010-09-09 | Seiko Epson Corp | 光源装置およびプロジェクタ |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0647014Y2 (ja) | 1994-11-30 |
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